2026-RFPN-00251 CH - Nanoimprint Lithography System

The Nanoimprint Lithography System is being acquired for the purposes of patterning semiconductor and nanodevice samples ranging from small pieces up to 100 mm round wafers.  Substrate materials may be silicon, glass, various III-V and II-VI materials, diamond, steel and flexible substrates such as Kapton.  It is important that the system be robust in nature and construction, possess maximum flexibility in operations, be easy to use and forgiving of inexperienced operators.
The system is intended to be used primarily for UV nanoimprint lithography.  The University welcomes nanoimprint lithography systems which operate by plate-to-plate and roll-to-plate methods.