40178-29C-RFP - Universal Measurement Spectrophotometer (UMS)

BACKGROUND:

Notice is hereby given by the University of Ottawa of the intent to enter into a contract with Agilent Technologies Canada Inc. to procure a Universal Measurement Spectrophotometer (UMS).

PROCESS:

Suppliers who consider their equipment functional, successfully tested, readily available and fully compliant to the ACAN minimum requirements may submit in writing a statement of specifications to the contact person identified in this Notice, on or before the closing date of this Notice.  In the statement of specifications, the supplier must unequivocally demonstrate how their equipment, at minimum, equals, or exceeds the stated requirements.

If no other supplier submits a statement of specifications, on or before the closing date of this Notice, the competitive requirements of the University of Ottawa will be considered having been met. Following notification to suppliers not successful in unequivocally demonstrating that their statement of specifications equals or exceeds the requirements set out in this Notice, the contract may then be awarded to the pre-identified supplier.

Date of issue: November 19, 2025  
Closing Date: December 3, 2025, 3:00 PM (EST)

INTENDED USE:

The Universal Measurement Spectrophotometer (UMS) will be used to perform advanced optical characterization of thin films and multilayered materials. Its primary purpose is to measure and analyze the reflectance, transmittance, and absorption properties of semiconductors and quantum materials. Dimension of samples ranges from 1 cm2 up to 4-inch wafers. The key materials for thin film include conducting polymer, transparent conducting oxides, perovskite quantum dots, carbon dots, metallic nanoparticles, and dielectric oxides.
The Universal Measurement Spectrophotometer (UMS) is essential for analyzing the reflectance, transmittance, and absorption properties of thin films, which directly correlate to the performance of our semiconductor devices in sensing chemicals, electronic structures, and interfacial properties. Our research focuses on thin films with thicknesses ranging from 10 nm to 300 nm. The equipment must exhibit superior measurement step resolution. This resolution is vital for accurately characterizing the subtle optical properties of our thin films and interfaces
Specifically, our quantum-material research is highly active in the UV-Vis-NIR range. The absorption characteristics of quantum dots, crucial for photodetector and display applications, are paramount to our investigations. The Universal Measurement Spectrophotometer (UMS) high-resolution absorption measurements across a wide spectral range will enable us to reveal critical parameters within multi-layered structures, directly informing our efforts to improve device performance.
The equipment will be installed in the ARC 527 laboratory, where it will be used for ambient environmental measurements to characterize the transparent and semi-transparent quantum-dot based photodetector and non-volatile memory device. This will enable us to advance our understanding of these materials and develop innovative technologies based on their unique properties.

FUNCTIONALITY:

The equipment must conform to the following Minimum Requirements:
Universal Measurement Spectrophotometer (UMS) is a high-performance, research-grade instrument designed for optical characterization. It delivers precise, repeatable measurements of three key parameters such as reflectance, transmittance, and absorption across a broad spectral range from 175-3300 nm, covering UV-Vis-NIR regions.

Its primary components include:

• Double out-of-plane Littrow monochromator: provides high spectral purity and resolution and allows fine wavelength selection and minimizing stray light for accurate measurement.
• Multi-detector system: the equipment is equipped with four high performance detectors, including photomultiplier tube (PMT) for UV-Vis range, a proprietary PbS detector for NIR (lower bandgap materials), and two-colored Si/InGaAs detector for extended range and sensitivity.
• Universal measurement accessory (UMA): This accessory provides independent angular positioning of the sample stage and the detector arm allowing measurement of reflectance/transmittance (and scatter) from the same spot without repositioning the sample.
• Variable angle and polarization control: it allows absolute spectral reflection and transmission measurements at various angles and supports s and p polarization, essential for detail interfacial analysis.
• Automated measurement: The software suite features user-friendly real-time data display.
• Environmental and operational control: When a film is reactive with oxygen or nitrogen, there is a purging option for both sample compartment and optics, which overcomes the limitation under standard laboratory condition.

• Wavelength resolution must be better than 0.1 nm at ambient environment in UV-Vis range.
• The detector must have a 360-degree rotational positioning capability
• The maximum power of the monochromated photonic source must be higher than 50 nW.
• The equipment must demonstrate data repeatability in the range of ±1 nm.
• The maximum count rate (electron count per second) must be higher than 1000 cps
• The photonic spot on the sample must be larger than 1 mm in diameter
• The dimension of samples ranges must be from 1 cm2 up to 4-inch wafers
• The maximum measuring energy must be larger than 6 eV.
• Reflectance-scattering measurement must be available in various angles.
• The software must demonstrate real-time data display on the screen.
• The equipment must not require a chiller to cool down the photonic source.
• The supplier must include on-site training.